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超低酸素分圧単結晶育成炉

Crystal Growth under Ultra Low Oxyen Partial Pressure

We have succeeded to develope a method of crystal growth under ultra low oxygen partial pressure for less than 10 to -24 atom. Now it is possible to develop high-quality single crystals of oxide compounds by our method. For example,


  • Mo oxides(SrMoO3, etc).
  • SrIrO3, SrRhO3, .....
  • Si crystal.
Si crystal obtained under ultra low oxygen partial pressure.
Si crystal obtained under ultra low oxygen partial pressure.