Yanfeng Gao, Yoshitake Masuda and Kunihito Koumoto
Department of Applied Chemistry, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
Chemistry of Materials, 16, 1062-1067
We report micropatterning of TiO2 thin film by a peroxotitanate complex deposition method, which was a method we developed recently. The deposition solution was obtained by dissolving titanic acid (H2TiO3) into a mixture solvent containing ammonia and hydrogen peroxide aqueous solution. The amorphous TiO2 micropattern with a high resolution was achieved by using a template of photomodified self-assembled monolayers at room temperature. The film showed high purity, flatness, and crack-free characteristics. The fundamental dielectric characteristics suggest that the micropatterned TiO2 thin films prepared by the present method are promising for application to dielectric layers.
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