Profile
Kakuya Iwata
National
Institute of Advanced Industrial Science and Technology (AIST)
Industrial CPS Research Center (Web page)
Field Robotics Research Team, Senior Researcher
Central 2,
1-1-1, Umezono, Tsukuba city, Ibaraki, Japan 〒305-8568
TEL:029-861-5612
FAX:029-861-3388
E-mail:k.iwata*aist.go.jp(Change
* to@)
Academic background
·
- Mar 1995 Completed Master's program
in Electromagnetic Energy Engineering, Graduate School of Engineering, Osaka
University
·
- Mar 1998 Completed Doctoral program in Electromagnetic Energy
Engineering, Graduate School of Engineering, Osaka University
·
- Mar 1998 Doctor of Engineering (Osaka University)1995.3 Osaka
University Master
Career
·
- Apr 1996 - Mar 1998 Research Fellow of the Japan Society for
the Promotion of Science (DC2)
·
- Apr. 1998 - Mar. 2001 Electronics Research Institute, Agency
of Industrial Science and Technology, Ministry of International Trade and Industry
·
- Apr. 2001 - Mar. 2008 National Institute of Advanced
Industrial Science and Technology (AIST)
·
- Apr. 2008 - Mar. 2009 Director, Information Promotion Section,
Industrial Machinery Division, Manufacturing Industries Bureau, Ministry of
Economy, Trade and Industry
·
- Apr. 2009 - Present Senior Researcher, National Institute of
Advanced Industrial Science and Technology (AIST)
Research achievements
1.Papers
1) "Gas source MBE growth of InAlP band offset reduction layer on p-type
ZnSe." K.Iwata, H.Asahi, J.H.Kim, X.F.Liu, S.Gonda, Y.Kawaguchi,
T.Matsuoka J. Crystal Growth, 150 (1995) pp.833-837.、1995/09
2) "Low temperature grown Be-doped
InAlP band offset reduction layer to p-type ZnSe." K.Iwata, H.Asahi,
T.Ogura, J.Sumino, S.Gonda, A.Ohki, Y.Kawaguchi and T.Matsuoka Journal of
Electronic Materials, 25 , pp.637-641.、1996/04
3) "High Quality GaN Growth on
(0001) Sapphire by Ion-Removed Electron Cyclotron Resonance Molecular Beam
Epitaxy and First Observation of (2x2) and (4x4) Reflection High Energy
Diffraction Patterns." K.Iwata, H.Asahi, S.J.Yu,
K.Asami, H.Fujita, M.Fushida and S.Gonda Jpn.J.Appl.Phys., 35, pp.L289-L292.、1996/05
4) "Gas source Molecular Beam
Epitaxy growth of GaN1-xPx(x<0.015) using Ion-Removed Electron Cyclotron
Resonance radical cell." K.Iwata, H.Asahi,
K.Asami and S.Gonda Jpn.J.Appl.Phys., 35 , pp.L1634-L1637.、1996/09
5) "Gas source Molecular Beam
Epitaxy growth of GaN rich side of GaN1-xPx using Ion-Removed Electron
Cyclotron Resonance radical cell." K.Iwata,
H.Asahi, K.Asami and S.Gonda J. Crystal Growth, 175, pp.150-155.、1997/06
6) "Gas Source Molecular Beam
Epitaxy Growth of GaN on C-,A-,R-,M-plane Sapphire and
Silica Glass Substrate." K.Iwata, H.Asahi,
K.Asami and S.Gonda Jpn.J.Appl.Phys., 36 , pp.L661-L664.、1997/09
7) Strong photoluminescence emission
from GaN grown on amorphous silica substrates by gas source MBE.,K.Iwata, H.Asahi, K.Asami, R.Kuroiwa and S.Gonda,Journal
of Crystal Growth,Vol.188(1998)pp.98-102-,pp.-、1998/06
8) GaN-rich side of GaNAs grown by gas
source MBE.,K.Iwata, H.Asahi,
K.Asami, R.Kuroiwa and S.Gonda,Japanese Journal of
Applied Physics,Vol.37(3B)(1998)pp.1436-1439,1998.、1998/07
9) Strong photoluminescence emission
from GaN grown on amorphous silica substrates by gas source MBE. K.Iwata, H. Asahi, K. Asami, R. Kuroiwa and S. Gonda J.
Crystal Growth, Vol.188, pp.98-102.、1998/07
10) GaN-rich side of GaNAs grown by gas
source MBE. K.Iwata, H. Asahi, K. Asami, R. Kuroiwa
and S. Gonda Jpn.J.Appl.Phys., Vol.37(3B), pp.1436-1439.、1998/09
11) Promising characteristics of GaN
grown on amorphous silica substrates by gas source MBE.,K.Iwata, H.Asahi, K.Asami, R.Kuroiwa and S.Gonda,Journal
of Crystal Growth,Vol.189,pp.218-222,1998.、1998/10
12) Promising characteristics of GaN
grown on amorphous silica substrates by gas source MBE. K.Iwata,
H. Asahi, K. Asami, R. Kuroiwa, H. Tampo and S. Gonda J. Crystal Growth,
Vol.189 , pp.218-222.、1998/11
13) Nitrogen-induced defects in ZnO: N
grown on sapphire substrate by gas source MBE,K.Iwata, P.Fons, A.Yamada, K.Matsubara
and S.Niki,Journal of crystal growth,209 (2000) 526-531,2000.、1999/04
14) "Nitrogen induced defects in ZnO:N grown on sapphire substrate by gas source MBE." K.Iwata, P.Fons, S.Niki, A.Yamada, K.Matsubara and M.
Watanabe J. Crystal Growth, 209, pp.526-531.、2000/02
15) Improvement of Electrical Properties
in ZnO Thin Films Grown by Radical source(RS)-MBE.,K.Iwata, P.Fons,
A.Yamada, K.Matsubara and S.Niki,Physica Status Solidi
(a),Vol.180, No.1, p.287-,pp.-、2000/07
16) "ZnO growth on Si by radical
source MBE." K.Iwata, P.Fons, A.Yamada,
K.Matsubara and S.Niki J. Crystal Growth , 214/215, pp.50-54.、2000/07
17) Improved electrical properties in
ZnO semiconductor films grown by radical source MBE.,K.Iwata, P.Fons, A.Yamada, K.Matsubara and S.Niki,THE
MATERIALS RESEARCH SOCIETY OF JAPAN SYMPOSIUM EXTENDED ABSTRACT,Vol.12, p.133-,pp.-、2000/12
18) "Improvement of Electrical
Properties in ZnO Thin Films Grown by Radical source(RS)-MBE."
K.Iwata, P.Fons, A.Yamada, K.Matsubara, K. Nakahara,
H. Takasu and S.Niki Physica Status Solidi (a) , Vol.180, No.1, p.287.、2000/12
19) Improved Electrical Properties in
ZnO Semiconductor Films Grown by Radical Source MBE,K.Iwata, P.Fons,
A.Yamada, K.Matsubara and S.Niki,TRANSACTIONS OF THE
MATERIALS RESEARCH SOCIETY OF JAPAN,26-3,pp.993-996、2001/09
20) Bandgap engineering of ZnO using Se,K.Iwata, P.Fons,
A.Yamada, K.Matsubara and S.Niki,PHYSICA STATUS SOLIDI
B-BASIC RESEARCH,229-,pp.887-890、2002/01
21) Natural ordering of ZnOSe grown by
radical source MBE,K.Iwata, P.Fons, A.Yamada, K.Matsubara and S.Niki,JOURNAL OF CRYSTAL GROWTH,251-,pp.633-637、2003/04
22) Material properties of ZnO thin film
for photovoltaic devices grown by URT-IP method,K.Iwata, P.Fons, A.Yamada, K.Matsubara
and S.Niki,THIN SOLID FILMS,445-,pp.274-277、2003/12
23) Doping properties of ZnO thin film
for photovoltaic devices grown by URT-IP method,K.Iwata, P.Fons, A.Yamada, K.Matsubara
and S.Niki,THIN SOLID FILMS,451-452-,pp.219-223、2004/03
24) Growth of ZnO and device application,K.Iwata, P.Fons,
A.Yamada, K.Matsubara and S.Niki,APPLIED SURFACE
SCIENCE,244-4,pp.504-510、2005/04
25) Improvement of ZnO TCO film growth
for photovoltaic devices by reactive plasma deposition (RPD),K.Iwata, P.Fons,
A.Yamada, K.Matsubara and S.Niki,THIN SOLID FILMS,480-481-,pp.199-203、2005/04
26) Aerial Robotic System for
Transportation and Logistics,K.Iwata, et al.,Journal of Mechanical
Systems for Transportation and Logistics(JMTL),1-1,pp.146-157、2008/05
27) Turbojet Engine for Aerial Cargo
Robot (ACR),K.Iwata, et al.,Journal of Robotics and
Mechatronics,24-6,pp.1040-1045、2012/12
28) Research of Cargo UAV for civil
transportation,K.Iwata, et al.,Journal of Unmanned System
Technology (JUST),1-3,pp.89-93、2013/12
29) Aerial Cargo Robot (Cargo UAV),K.Iwata, et al.,Journal of Robotics and Mechatronics,26-3,pp.394-395、2014/06
30) SAFETY FLIGHT TESTING FOR CARGO UAV
DEVELOPMENT,K.Iwata, et al.,Proceedings of ICAS2018,31-1,pp.754-762、2018/09
31) Research of Verification of Limit
for Industrial Solid Wing UAV,K.Iwata, et al.,International Journal of
Intelligent Unmanned Systems (IJIUS),22-1,pp.67-73、2022/08
2. Links
Cargo UAV Research